SEMICONDUCTOR
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Grating Structures

Grating Structures

Grating type: Lines and Spaces, Holes and Pillars in rectangular and hexagonal lattice

Diameter: 50.8 mm, 76.2 mm, 100 mm, 150mm, 200mm (on request)

Substrate: Silicon, Glass, Quartz …

Period: 400nm to 1000nm entire area

Structure Size: 50nm – 600nm typical

Etching depth: 20nm – 500nm typical

 

 

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